标題: Enhanced visible-light photocatalysis of clofibric acid using graphitic carbon nitride modified by cerium oxide nanoparticles

作者: Lin, H (Lin, Heng); Tang, X (Tang, Xin); Wang, J (Wang, Jing); Zeng, QY (Zeng, Qingyuan); Chen, HX (Chen, Hanxiao); Ren, W (Ren, Wei); Sun, J (Sun, Jie); Zhang, H (Zhang, Hui)

來源出版物: JOURNAL OF HAZARDOUS MATERIALS  卷: 405  文獻号: 124204  DOI: 10.1016/j.jhazmat.2020.124204  出版年: MAR 5 2021  

摘要: Recently, the emerging pharmaceutical micropollutants have become an environmental concern. Herein, we report an efficient elimination of clofibric acid (CA) using visible light-driven g-C3N4/CeO2 prepared by hydrothermal method. Among the catalysts with different compound ratios, g-C3N4/CeO2-3 (1.2 g g-C3N4 with 3 mmol Ce(NO3)(3)center dot 6H(2)O) exhibited the best photocatalytic performance. The effect of catalyst dosage was investigated and the optimal value was determined as 0.5 g L-1. The effect of initial pH (pH(0)) showed CA elimination decreased with increasing pHo . The underlying mechanism for CA oxidation was proposed based on synthetical analysis of photoluminescence emission spectra, transient photocurrent responses, electron paramagnetic resonance, chemical quenching experiments and band edge potential of g-C3N4 and CeO2. Photogenerated hole was primarily responsible for CA elimination while singlet oxygen played an auxiliary role. The products of CA oxidation were detected using liquid chromatography mass spectrometry (LC-MS) method and a possible pathway was put forward. Various organics were used as target contaminants to assess photocatalytic performance of g-C3N4/CeO2 heterojunction under acidic and alkaline pH conditions. The analysis of relationship between the oxidation peak potential (Eop) and the reaction rate constant indicated that photocatalysis using as prepared g-C3N4/CeO2-3 heterojunction is apt to oxidize contaminants with electron withdrawing group under acid condition.

入藏号: WOS:000616156600006

PubMed ID: 33131938

語言: English

文獻類型: Article

作者關鍵詞: Clofibric acid; g-C3N4/CeO2 Heterojunction; Nonradical pathway; Photocatalysis; Oxidation mechanism

地址: [Lin, Heng; Tang, Xin; Wang, Jing; Zeng, Qingyuan; Chen, Hanxiao; Ren, Wei; Zhang, Hui] Wuhan Univ, Dept Environm Sci & Engn, Hubei Biomass Resource Chem & Environm Biotechnol, Wuhan 430079, Peoples R China.

[Sun, Jie] South Cent Univ Nationalities, Coll Resource & Environm Sci, Key Lab Catalysis & Mat Sci, State Ethn Affairs Commiss, Wuhan 430074, Peoples R China.

[Sun, Jie] South Cent Univ Nationalities, Coll Resource & Environm Sci, Minist Educ, Wuhan 430074, Peoples R China.

通訊作者地址: Lin, H; Zhang, H (通訊作者)，Wuhan Univ, Dept Environm Sci & Engn, Hubei Biomass Resource Chem & Environm Biotechnol, Wuhan 430079, Peoples R China.

電子郵件地址: lheng2015@whu.edu.cn; eeng@whu.edu.cn

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